Effects of Annealing Condition on Low-k a-SiOC:H Thin Films

نویسندگان

  • Jaeyeong Heo
  • Hyeong Joon Kim
چکیده

Low-k films with the lowest dielectric constant k of 2.36 were prepared to investigate effects of ambient annealing conditions on the electrical and structural properties of the films. The annealing in an N2 ambient does not affect the methyl groups that bond to Si atoms while it removes thermally unstable methyl fractions, resulting in a large decrease of k value. Annealing in oxygen ambient increases the k value of the film compared to that of the as-deposited sample. The addition of hydrogen in N2 annealing ambient slightly increases the surface hydrophilicity while the film maintains lower dielectric constant. © 2007 The Electrochemical Society. DOI: 10.1149/1.2432944 All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Effects of Annealing and Thickness on the Structural and Optical Properties of Crystalline ZnS Thin Films Prepared by PVD Method

Zinc Sulfide (ZnS) thin films were deposited on glass substrates at the pressure of 10-6 mbar by thermal resistor evaporation technique. The effects of annealing on the structural, optical properties of ZnS films were studied. Crystalline ZnS films have been analyzed by X-ray diffraction. Only cubic phase with the preferred (111) plane was found in ZnS films. Optical characteristics were studie...

متن کامل

Investigation of Structural, Morphological and Optical Properties of Chromium Oxide Thin Films Prepared at Different Annealing Times

Chromium oxide (α-Cr2O3) thin films were prepared using thermal annealing of chromium (Cr)films deposited on quartz substrates by direct current (DC) magnetron sputtering. The annealingprocess of the films was performed for different times of 60, 120,180 and 240 min. The influenceof annealing time on structural, morphological and optical properties of the prepared films wasinvestigated by diffe...

متن کامل

Thermal Annealing Influence over Optical Properties of Thermally Evaporated SnS/CdS Bilayer Thin Films

Thin films of tin sulfide/cadmium sulfide (SnS/CdS) were prepared bythermal evaporation method at room temperature on a glass substrate and then annealedat different temperature with the aim of optimizing the optical properties of the materialfor use in photovoltaic solar cell devices. The effect of annealing on optical propertiesof SnS/CdS film was studied in the temper...

متن کامل

Annealing Temperature Effects on the Optical Properties of MnO2: Cu Nanostructured Thin Films

   In this work, the effect of annealing temperature on the microstructure, morphology, and optical properties of Cu-doped nanostructured MnO2 thin films were studied. The thin films were prepared by sol-gel spin-coating technique on glass substrates and annealed in the air ambient at 300, 350, 400 and 450 °C temperatures. The structural, morphological and optical properties of t...

متن کامل

Annealing temperature effect on nanostructure and phase transition of Copper Oxide thin films

This paper addresses the annealing temperature effect on nanostructure and phase transition of copper oxide thin films, deposited by PVD method on glass substrate (at 110 nm thickness) and post annealed at different temperatures (200-400°C) with a flow of 1 cm3s-1 Oxygen. The X-ray diffraction (XRD) was employed for crystallographic and phase analyses, while atomic force m...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2007